Roll the swab on a cleanwipe to remove excess liquid.Squirt some EBR onto a COTTON swab (not plastic swab! They will dissolve.).(Do NOT bring Acetone onto the spin-benches! The fumes affect nearby PR.) Only use this chemical in a fume hood, and dispose in the waste in the fume hood waste containers. ![]() This works well for small samples, if the substrate material is not fragile (works well for Silicon, Sapphire, GaAs, Silica etc.).Įspecially useful for photoresists that don't chemically dissolve easily, such as PMGI, SU8, BCB.ĮBR100 squirt bottles can be found on the spinner benches. Use a razor blade to scrape off the edge-bead regions. For some projection systems, such as the Maskless Aligner, EBR can help with autofocus issues.For contact lithography, this improves the proximity of the mask plate and sample, improving resolution.These techniques are required for loading full-wafers into etchers that use top-side clamps, to prevent photoresist from sticking to the clamp (and potentially destroying your wafer).edge-bead removal, EBR) has multiple advantages: ![]() Removing the thicker photoresist along the edges of your sample (aka.
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